Buried Boron
نویسندگان
چکیده
منابع مشابه
Boron deactivation in preamorphized silicon on insulator: Efficiency of the buried oxide as an interstitial sink
Preamorphization of ultrashallow implanted boron in silicon on insulator is optimized to produce an abrupt boxlike doping profile with negligible electrical deactivation and significantly reduced transient enhanced diffusion. The effect is achieved by positioning the as-implanted amorphous/ crystalline interface close to the buried oxide interface to minimize interstitials while leaving a singl...
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ژورنال
عنوان ژورنال: Science
سال: 2010
ISSN: 0036-8075,1095-9203
DOI: 10.1126/science.330.6006.891-d